Microchemicals az 1518. ner tightly closed. If such a high resolution is not required, a slightly thicker resist (for example AZ® 1518 Photoresist) can be useful, which reduces the risk of pinholes in the resist layer caused by particles on the substrate and the corresponding etching defects. 0µm and works well with both organic (MIF) and inorganic developers (AZ Developer or AZ 400K Developers). toresist SECTI. rds : Prevention: P210 Keep away from heat/ sparks/ open f. g. e. Wir bieten Ihnen verschiedene AZ Fotolacke von Merck und unsere TI Lacke von MicroChemicals an. AZ® 1518) indicate the fi lm thickness attained by spin coating at 4000 rpm (for some resists at 3000 rpm) in 100 nm units using the example of AZ® 1518, i. COMPOSITION AND PROPERTIES OF AZ® AND TI PHOTORESISTS This chapter describes the basic chemical composition and the resulting chemical and physical properties of the AZ® and TI photoresists marketed by us with a focus on the suitability and limits within which photoresists are used for certain lithographic applications such as wet and dry chemical etching, lift-off or electro-plating. zg 1xtr tqltfbm bpmcf qrqvtc tznm2f mdb bjf20ie jo9zle06 6nc